Cathodic Arc PVD Coater adopts a method of arc discharge to evaporate directly metal from solid cathode targets and the evaporated material is ions from cathode substance released from the cathode arc glow, thereby deposit films on the surface of the substrate.
This equipment is designed to use advanced plasma technology, combining technique of electric arc discharging with magnetron sputtering coating technique by reactive coating method, for achievement of imitation of golden film, gold saturated film as well as other superior decorating films.
Magnetron sputtering vacuum coater is an updated sputtering coating technique with advantages of high sputtering speed, lower temperature, stable performance and simple manipulation, etc.
By this equipment, the metallic film, iridescent film, golden film can be coated with sputtering evaporation on the metals, pre-treated plastic, glass, mica and ceramic products. Just using different targets with reactive gas inflation can realize different films.
High vacuum web coater is specially designed equipment for coating aluminium films or oxidant compound films or other metallic films on rolls of any polyester membranes. It can be also equipped with both wire-feeding system, MF melting pot, DC or MF sputtering metallization function as per customers specific requirements to realize certain coating purposes.
Features of equipment
Spraying from bottom, material flow in order. We can get uniform and continuous film.
Taste masked, moisture-proof, anti-oxidation, waterproof, heat insulation, coloration and separated coating.
No coating material is wasted, meanwhile, reducing the product cost.
Short distance of the fog granule, and without the problem of fªspray dryingfª.
The design of cylinder accelerator or cone decelerate can coat all kinds of granule and pellets.
High separation, without adhere.
The magnetron sputtering/vacuum evaporation composite coating equipment combines magnetron sputtering technology and vacuum evaporation technology in one coating equipment. In this device, magnetron sputtering cathode glow discharge is used to sputter the target atoms and partially ionize and deposit them on the substrate to form a film, and at the same time, the metal plating material can be melted in a vacuum by resistance heating and vaporized and then deposited on the substrate to form a film. This increases the utility and flexibility of the device. The equipment is used for metallization of plastic surface such as mobile phone case and deposition of non-conductive film and electromagnetic shielding film.
The magnetron sputtering/vacuum evaporation composite coating equipment is equipped with a plasma processing device, a high-efficiency magnetron sputtering cathode and a resistance evaporation device, etc. The deposition rate of this device is fast, the coating adhesion is good, the plating layer is fine and compact, the surface finish is high, the uniformity and consistency is good; the machine realizes full automatic control of coating process, large load, reliable work, high qualification rate, low production cost and green environmental protection. The device is widely used in computer casings, mobile phone cases, household appliances and other industries, and can be coated with metal film, alloy film, composite film layer, transparent (translucent) film, non-conductive film, electromagnetic shielding film and the like.
1.This machine is avalible to the base/surface paint coating for the furniture/flooring/cobniet/walling/decorative boards,which different materials like as wood/MDF/plastic/metal/glass/casi and so on.
2.It can ensure the sureface of the paint to be smooth,with good plumpness, and with no chromatic difference.
3.The roller coater and the electronic roller and the conveyor controlled by separate motor/reducer/frequency,with best precision and stability.
4.It is easy to change the roller with the casting design.
5.It can be choose with the PLC,automatic elevator,separate electronic box or more automaticl choosing outfil.
High vacuum magnetron sputtering coater is specially designed for automobile & motorcycle hubcap coating or metallizing with unique features and special structure designed, enabling to meet the needs of all the technical demands. Equipped with cryo-pump (Poly-Cold), it can realize very high coating efficiency.
With specially designed cathodes structure to realize sputtering high ratio, it can accomplish each coating cycle within 8~12 minutes under computer & PLC control.
The substrate rack driving system with both revolution and rotation functions plus substrate self-rotation, is able to ensure the coating evenness and uniformity.
The small plasma sputtering and evaporation two-in-one coating machine is equipped with DC sputtering target and thermal evaporation assembly, which can not only be used for metal film plating by plasma sputtering, but also obtain carbon or other metal elemental films by evaporation.
The instrument components are highly integrated, which realize two kinds of coating functions in the same chamber. This coating machine adopts high purity quartz chamber as vacuum chamber, and the coating process is completely visible. The instrument is equipped with two stage rotary vane vacuum pump, which can quickly reach the vacuum degree of 1.0E-1pa, and can meet the vacuum environment required by most evaporation coating experiments and diode sputtering experiments. This instrument has small size which can save space and can be used on the test bench. One machine has multiple purposes, which is cost-effective and very suitable for major universities and research institutions to choose.
Small two-in-one coating machine applications:
Scanning electron microscope sample surface gold spraying, gold steaming carbon spraying and other operations, as well as the production of non-conductor material test electrode.
Double target magnetron sputtering coater is a small laboratory coater with two targets developed by our company. It can be used to prepare single or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic film, dielectric film, optical film, etc.
Compared with ordinary plasma sputtering, magnetron sputtering has the advantages of high energy, high speed, high coating rate and low sample temperature rise, which is a typical high-speed low-temperature sputtering. The magnetron target is equipped with a water-cooled inter layer, the water cooler can effectively take away heat, avoid heat gathering on the target surface, and make the magnetron coating work stably for a long time.
In addition, the device is also equipped with bias power supply, which can add bias electric field between the target and the sample platform, enhance the energy of ions, improve the film quality and adhesion of the film. The whole machine adopts touch screen control, one key coating procedure, simple operation, and is an ideal equipment for preparing thin film in the laboratory.
