The Rotary Sputtering target are produced by either plasma spraying onto a base tube or from solid pieces, Lengths of over 3000 mm are manufactured.
Complementing our advanced thermal spray capability, Able Target Limited have developed proprietary casting capability to manufacture select rotatable sputtering targets to meet high density and high purity specifications.
Rotary Sputtering Target Relative density: >99% Purity: >99.5%â?¥99.999%
Rotary sputtering target size: Ï?56~190mm L: 120~5000 mm
Our Rotary Sputtering target materials including :
ZnO,i-ZnO, AZO, TiOx, TZO, ZnAl,CuGa, ZrO2,WOx,NbOx, Al2O3, Cu, Al, Sn, ZnSn, InSn, ATO, CdTe, V,NiCr, NiV, CrAl,CrAlSi, AlTi,AlSn, Cr, AlTi, Ti, Zr, Hf,Mo, MoNb, Inconiel, W, Ta, Nb, SiAl, Si, etc.
Supplier: Sio2 granule, mgf2 granule, zro2 granule, al2o3 granule, ta2o5 granule, hfo2 granule, ito granule, ti2o3 granule, tio2 granule, zns granule, block silicon carbide target, rotating silicon target, titanium sputtering target,
titanium aluminum target, nickel sputtering target, zirconium sputtering target, ito tablet
tiox target, zns tablet sintering, sio granule
sio2 powder, tio2 powder, ito powder, ato powder, al2o3 powder, titanium boride, infrared ge lens, infrared inspection windows, lif crystal
monocrystalline silicon window, caf2 windows
blanks of mgf2, lif crystals windows, baf2 windows, infrared windows, right angle prism
pentagon prism, si plano convex spherical lens,
baf2 plano convex spherical, znse spherical lens, caf2 spherical lens, cylindrical lens, mgf2 crystal, lif granule and baf2 granule
